Experience talking here and I absolutely agree. I use the Calumet wafer for the same net effect. Clearly there are a lot of mathematicians, engineers, scientists in LF/ULF photography that feel empowered to develop any number of iterations for bellows correction. But any measurement irrespective of how "careful" it is deployed and the computation that follows plays second fiddle to the image on the ground glass. And that is all that matters.
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